High Purity Sn, Al, Zn, Co, Mg

High purity metal sputtering target material (3N-6N):

Aluminum target(Al), chromium target(Cr), copper target(Cu), nickel target(Ni), silicon target(Si), germanium target(Ge), niobium target(Nb), titanium target(Ti), indium target(In), silver target(Ag), tin target(Sn), graphite target, tantalum target(Ta), molybdenum target(Mo), gold target(Au), hafnium target(Hf), manganese target(Mn), zirconium target(Zr), magnesium target(Mg), zinc target(Zn), lead target(Pb), iridium target(Ir), yttrium target(Y), cerium target(Ce), lanthanum target(La), ytterbium target(Yb), gadolinium target(Gd), platinum target(Pt), etc..

Located in Zhongguancun Science and Technology Park, China New Metal Materials Technology Co.,Ltd (hereinafter referred to as CNM), is one of the Chinese Nonferrous Metal Industry company specializing in research and develop of new materials. As the initiator of leading enterprises in the industry, The company has first-class equipment, advanced technology, strong research team and modern management concepts, to build Chinese and even the world's most influential non-ferrous metal new materials, new technology and new process development and production center. After years of unremitting efforts, CNM has under it division Departments of Coating materials, Sputtering target, Metal powder and Alloy materials, High purity metal materials, and developed many series of new materials, which about one hundred kinds of product brands have been applied widely in such industries like aviation and space, military project, infotronics, vacuum coating, magnetron sputtering, metallurgy, functional material, biological medicine and new energy. Our products are exported to Korea, Japan, Europe, the United States and Southeast Asia, highly praised by customers, and we will make persistent efforts, to provide a full range of services with high quality products. We are sure you will be satisfied with CNM.